A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27
- Author(s):
- Majoni, S. ( Philips GmbH (Germany) )
- Driessen, F.A. ( Synopsis, Inc. (Netherlands) )
- Kasprowicz, B.S. ( Photronics, Inc. (USA) )
- Harris, P.D. ( Nikon Precision Europe GmbH (United Kingdom) )
- Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1342
- Page(to):
- 1349
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
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