Key challenges in across-pitch 0.33-k1 trench patterning using hybrid mask
- Author(s):
Singh, N. ( Institute of Microelectronics (Singapore) ) Mukherjee-Roy, M. ( Institute of Microelectronics (Singapore) ) Mehta, S.S. ( Institute of Microelectronics (Singapore) ) Suda, H. ( HOYA Corp. (Japan) ) Kubota, T. ( HOYA Corp. (Japan) ) Kimura, Y. ( HOYA Corp. (Japan) ) Kinoshita, H. ( HOYA Corp. (Japan) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1334
- Page(to):
- 1341
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.3
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Effect of feature size, pitch, and resist sensitivity on side-lobe and ring formation for via hole patterning in attenuated phase-shift masks
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Magnetostrictive Properties of TbxDy1-xFe(x=0.3, 0.33; Y=1.05. 1.36, 1.65) Composite Made by Directional Solidification and Polymer Infiltration
Trans Tech Publications |
SPIE - The International Society of Optical Engineering |
Trans Tech Publications |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Electrical Transport Effects in the Epitaxial La0.67Ca0.33MnO3 Films and La0.67Ca0.33MnO3/(LaNiO3,RuO2)Heterostructures
Trans Tech Publications |
6
Conference Proceedings
Evaluation of alignment target designs for Cu and low-K dual damascene processes
SPIE-The International Society for Optical Engineering |
Materials Research Society |