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Implementation of pattern-specific illumination pupil optimization on Step & Scan systems

Author(s):
Engelen, A. ( ASML (Netherlands) )
Socha, R.J. ( ASML (USA) )
Hendrickx, E. ( IMEC (Belgium) )
Scheepers, W. ( ASML (Netherlands) )
Nowak, F. ( ASML (Netherlands) )
Van Dam, M. ( ASML (Netherlands) )
Liebchen, A. ( ASML (USA) )
Faas, D.A. ( ASML (Netherlands) )
3 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1323
Page(to):
1333
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.3
Type:
Conference Proceedings

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