The impact of MEEF through pitch for 120-nm contact holes
- Author(s):
Litt, L.C. ( Motorola (USA) ) Wu, W. ( Motorola (USA) ) Conley, W. ( Motorola (USA) ) Lucas, K.D. ( Motorola (USA) ) Roman, B.J. ( Motorola (USA) ) Montgomery, P. ( Motorola (USA) ) Kasprowicz, B.S. ( Photronics, Inc. (USA) ) Progler, C.J. ( Photronics, Inc. (USA) ) Socha, R.J. ( ASML (USA) ) Verhappen, A. ( ASML (Netherlands) ) Wampler, K.E. ( ASML (USA) ) Schaefer, E. ( ASML (USA) ) Cook, P. ( ASML (USA) ) Kuijten, J.-P. ( ASML (Netherlands) ) Pijnenburg, W. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 1305
- Page(to):
- 1314
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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