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Feasibility studies of ArF chromeless mask (CLM) for sub-80-nm era

Author(s):
  • Eom, T.-S. ( Hynix Semiconductor Inc. (South Korea) )
  • Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) )
  • Sung, M.G. ( Hynix Semiconductor Inc. (South Korea) )
  • Moon, S.-C. ( Hynix Semiconductor Inc. (South Korea) )
  • Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1287
Page(to):
1296
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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