Advances in vortex via fabrication

Advances in vortex via fabrication

Author(s):

Levenson, M.D. ( M.D. Levenson Consulting (USA) )

Ebihara, T.J. ( Canon USA, Inc. (USA) )

Reilly, M. ( Shipley Co. Inc. (USA) )

Barclay, G. ( Shipley Co. Inc. (USA) )

Vorha, V. ( Shipley Co. Inc. (USA) )

Stafford, C. ( Shipley Co. Inc. (USA) )

Mastovich, M.E. ( Soluris Inc. (USA) )

Morikawa, Y. ( Dai Nippon Printing Co., Ltd. (Japan) )

Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )

4 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1237

Page(to):

1246

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Vortex via validation Levenson, M.D., Ebihara, T., Morikawa, Y., Hayashi, N. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Secondary-electron image profiles using bias voltage technique in deep contact hole Ko,Y.-U., Joy,D.C., Sullivan,N.T., Mastovich,M.E. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Vortex via process: analysis and mask fabrication for contact CDs <80 nm Levenson, M.D., Tan, S.M., Dai, G., Morikawa, Y., Hayashi, N., Ebihara, T. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Beyond k1=0.25 lithography: 70-nm L/S patterning using KrF scanners Ebihara, T., Levenson, M.D., Liu, W., He, J., Yeh, W., Ahn, S., Oga, T., Shen, M., M'saad, H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings The vortex mask: making 80-nm contacts with a twist! Levenson, M.D., Dai, G., Ebihara, T. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Application of attenuated phase-shift masks to sub-0.18-ｦﾌm logic patterns Fritze,M., Wyatt,P.W., Astolfi,D.K., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., Denault,S., Chan,D., Shaw,J.C., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings Exposing the DUV SCAAM: 75-nm imaging on the cheap Levenson, M.D., Ebihara, T. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Negative tone 193-nm photoresists Pugliano, N., Bolton, P.J., Barbieri, T., King, M., Reilly, M.T., Lawrence, W., Kang, D., Barclay, G.G. SPIE-The International Society for Optical Engineering
5 Conference Proceedings SCAA mask exposures and Phase Phirst designs for 100 nm and below Levenson,M.D., Ebihara,T., Yamachika,M. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Advances in Step and Flash imprint lithography Johnson, S.C., Bailey, T.C., Dickey, M.D., Smith, B.J., Kim, E.K., Jamieson, A.T., Stacey, N.A., Ekerdt, J.G., Willson, … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication Fritze,M., Burns,J.M., Wyatt,P.W., Astolfi,D.K., Forte,T., Yost,D., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., … SPIE - The International Society for Optical Engineering	12 Conference Proceedings Phase phirst! An improved strong-PSM paradigm Levenson,M.D., Petersen,J.S., Gerold,D.G., Mack,C.A. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12