Experimental verification of a model-based decomposition method for double dipole lithography

Experimental verification of a model-based decomposition method for double dipole lithography

Author(s):

Eurlings, M. ( ASML (Netherlands) )

Hsu, S.D. ( ASML (USA) )

Hendrickx, E. ( IMEC (Belgium) )

op 't Root, W. ( Technische Univ. Eindhoven (Netherlands) )

Laidig, T.L. ( ASML (USA) )

Chiou, T.-B. ( ASML (Taiwan) )

Chen, A. ( ASML (Taiwan) )

Chen, F. ( ASML (USA) )

Vandenberghe, G. ( IMEC (Belgium) )

Finders, J. ( ASML (Netherlands) )

5 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1225

Page(to):

1236

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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