Blank Cover Image

Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond

Author(s):
  • Hsu, S.-H. ( United Microelectronics Corp. (Taiwan) )
  • Fang, S.-P. ( United Microelectronics Corp. (Taiwan) )
  • Huang, I.H. ( United Microelectronics Corp. (Taiwan) )
  • Lin, B.S. ( United Microelectronics Corp. (Taiwan) )
  • Hung, K.-C. ( United Microelectronics Corp. (Taiwan) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1214
Page(to):
1224
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Challenges of 50-nm gate process in alternating phase shifting lithography

Fang, C.Y., Hung, K.C., Huang, Z.X., Lin, B.S., Hsu, S.H., Yen, Y.S., Yen, P.W., Huang, J., Liu, H.Y.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Improvement of 90nm KrF Cu process window by minimizing via deformation caused by low-frequency resonance of scanner projection lens

Fang, S.-P., Lin, B.S., Hung, K.-C.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography

Chang, C.H., Schacht, J., Lin, B.S.-M, Hung, K.C., Huang, I.H.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Implementing AAPSM in 90-nm product with practical image imbalance correction

Lin, B.S., Hsu, S.-, Huang, I.H., Chen, K., Hsieh, F., Hsu, T., Liu, H.-Y., Kroyan, A., Hsu, F., Huang, J.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography

Fang, S. P., Yang, H., Chang, H., Chiang, P., Lin, B. S.-M., Hung, K.-C.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Binary mask defect printability for 130-nm ArF lithography

Lin,S.C., Chen,J.H., Hsu,T.H., Hung,J.C.C., Lin,J.C.H.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Practical approach for AAPSM image imbalance correction for sub-100-nm lithography

Cho, H.L., Lin, S.Y., Hsieh, F., Kroyan, A., Liu, H.-Y., Huang, J.H., Hsu, S.-H., Huang, I-H., Lin, B.S.-M., Hung, K.-C.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Global pattern density effects on low-k trench CDs for sub-65-nm technology nodes [6152-05]

Hsu, J. W., Shieh, J. H., Doong, K. Y. Y., Hung, L. J., Lin, S. C., Ting, C. Y., Jang, S. M., Young, K. L., Liang, M. S.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Double dipole lithography for 65-nm node and beyond: defect sensitivity characterization and reticle inspection

Hsu, S., Chu, T. -B., Van Den Broeke, D., Chen, J. F., Hsu, M., Corcoran, N. P., Volk, W., Ruch, W. E., Sier, J. -P., …

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Optimization of resist shrink techniques for contact hole and metal trench ArF lithography at the 90-nm technology node

Wallace, C., Schacht, J., Huang, I.H., Hsu, R.H.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Optimization of alternating PSM mask process for 65-nm poly-gate patterning using 193-nm lithography

Tan, S.-K., Lin, Q., Hsia, L.C., Sun, S.-C.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Optimization of multi-step development scheme to improve the critical dimension uniformity

Chang, H., Lin, B. S. -M., Hung, K. -C., Fang, S. -P., Hsu, T.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12