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Phenomena and OPC solution of ripple patterns for 65-nm node

Author(s):
Lai, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ho, J.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lai, C.-W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsai, C.-K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsay, C.-S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Chen, J.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R.-G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ku, Y.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B.-J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
4 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1165
Page(to):
1171
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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