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Fulfillment of model-based OPC for contact patterns in 60-nm level logic device

Author(s):
Kim, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, C.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Choi, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, Y.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Kang, Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Yeo, G.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, J.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
5 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
1157
Page(to):
1164
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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