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MEV as a new constraint for lithographers in the sub-100-nm regime

Author(s):
Trouiller, Y. ( LETI-CEA (France) )
Postnikov, S.V. ( Motorola (France) )
Lucas, K.D. ( Motorola (France) )
Sundermann, F. ( STMicroelectronics (France) )
Patterson, K. ( Motorola (France) )
Belledent, J. ( Philips Semiconductors (France) )
Couderc, C. ( Philips Semiconductors (France) )
Rody, Y.F. ( Philips Semiconductors (France) )
3 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. date:
2004
Page(from):
1081
Page(to):
1092
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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