Defect printability in CPL mask technology

Defect printability in CPL mask technology

Author(s):

Kuijten, J.-P. ( ASML (Netherlands) )

Verhappen, A. ( ASML (Netherlands) )

Pijnenburg, W. ( ASML (Netherlands) )

Conley, W. ( Motorola (USA) )

Litt, L.C. ( Motorola (USA) )

Wu, W. ( Motorola (USA) )

Montgomery, P. ( Motorola (USA) )

Roman, B.J. ( Motorola (USA) )

Kasprowicz, B.S. ( Photronics, Inc. (USA) )

Progler, C.J. ( Photronics, Inc. (USA) )

Socha, R.J. ( ASML (USA) )

Van Den Broeke, D.J. ( ASML (USA) )

Schaefer, E. ( ASML (USA) )

Cook, P. ( ASML (USA) )

9 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1032

Page(to):

1039

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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