Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks

Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks

Author(s):

Nakagawa, K.H. ( DuPont Photomasks, Inc. (USA) )
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
Park, K. ( DuPont Photomasks, Inc. (USA) )
Buck, P. ( DuPont Photomasks, Inc. (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

1025

Page(to):

1031

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node Patterson, K., Litt, L.C., Maltabes, J.G., Hughes, G.P., Robertson, T., Montgomery, B. SPIE-The International Society for Optical Engineering	7 Conference Proceedings TiSi-nitride attenuating phase-shift photomask for 193-nm lithography Reynolds,G.A.M., French,R.H., Carcia,P.F., Torardi,C.C., Hughes,G.P., Jones,D.J., Lemon,M.F., Reilly,M., Wilson,L., … SPIE - The International Society for Optical Engineering
2 Conference Proceedings A novel mask-based approach to improve low-k1 corner and angle definition in alternating-aperture phase-shift mask structures Nakagawa, K. H., Siefers, D., MacDonald, S., Buck, P. D. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Error budget for a 193-nm complementary phase-shift mask Eib, N.K., Kobozeva, O., Neville, C., Croffie, E.H. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Study of OPC for AAPSM reticles using various mask fabrication techniques Hughes, G.P., Kamaruddin, D., Nakagawa, K.H., MacDonald, S., Wilkinson, B., West, C., Park, K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Image imbalance compensation in alternating phase-shift masks towards the 45-nm node through-pitch imaging [5992-65] Van Look, L., Kasprowicz, B., Zibold, A., Degel, W., Vandenberghe, G. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Analysis of off-axis-illumination-based phase-edge/chromeless mask technologies Croffie, E.H., Taravade, K.N., Callan, N., Park, K., Hughes, G.P. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Manufacturing of ArF chromeless hard shifter for 65-nm technology Park, K.-T., Dieu, L., Hughes, G.P., Green, K.G., Croffie, E.H., Taravade, K.N. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Defect printability analysis on alternating phase-shifting masks for 193-nm lithography Morikawa, Y., Totsu, Y., Nishiguchi, M., Hoga, M., Hayashi, N., Pang, L., Luk-Pat, G.T. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control Y. Kojima, M. Shirasaki, K. Chiba, T. Tanaka, Y. Inazuki, H. Yoshikawa, S. Okazaki, K. Iwase, K. Ishikawa, K. Ozawa SPIE - The International Society of Optical Engineering
6 Conference Proceedings Through-pitch correction of scattering effects in 193-nm alternating phase-shift masks Burkhardt, M., Gordon, R.L., Hibbs, M.S., Brunner, T.A. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Effect of phase error on 180-nm and 250-nm grouped-line KrF lithography using an alternating phase-shift mask Petersen,J.S., Williams,A.M., Rich,G.K., Miller,D.A., Martinez,A.M.,Jr. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12