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BEOL lithography for early development at the 65-nm node

Author(s):
DellaGuardia, R. ( IBM Microelectronics Div. (USA) )
Kwong, R.W. ( IBM Microelectronics Div. (USA) )
Li, W. ( IBM Microelectronics Div. (USA) )
Lawson, P. ( IBM Microelectronics Div. (USA) )
Burkhardt, M. ( IBM Microelectronics Div. (USA) )
Grauer, I.C. ( IBM Microelectronics Div. (USA) )
Wu, Q. ( IBM Microelectronics Div. (USA) )
Angyal, M. ( IBM Microelectronics Div. (USA) )
Hichri, H. ( IBM Microelectronics Div. (USA) )
Melville, I. ( IBM Microelectronics Div. (USA) )
Kumar, K. ( IBM Microelectronics Div. (USA) )
Lin, Y. ( IBM Microelectronics Div. (USA) )
Holmes, S.J. ( IBM Microelectronics Div. (USA) )
Varanasi, R. ( IBM Microelectronics Div. (USA) )
Spooner, T. ( IBM Microelectronics Div. (USA) )
McHerron, D. ( IBM Microelectronics Div. (USA) )
11 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. date:
2004
Page(from):
980
Page(to):
987
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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