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A new process for accurate alignment using laser ablation technology

Author(s):
Ikegami, H. ( Toshiba Corp. (Japan) )
Kawano, K. ( Toshiba Corp. (Japan) )
Ishigo, K. ( Toshiba Corp. (Japan) )
Higashiki, T. ( Toshiba Corp. (Japan) )
Hayasaka, N. ( Toshiba Corp. (Japan) )
Yoshitaka, N. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kashiwagi, H. ( Tokyo Electron Kyushu Ltd. (Japan) )
Kobayashi, M. ( Dainippon Screen Manufacturing Co., Ltd. (Japan) )
Ogawa, Y. ( Dainippon Screen Manufacturing Co., Ltd. (Japan) )
Ito, S. ( Toshiba Corp. (Japan) )
5 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
960
Page(to):
967
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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