Double exposure to reduce overall line-width variation of 80-nm DRAM gate
- Author(s):
Ma, W.-K. ( Hynix Semiconductor Inc. (South Korea) ) Lim, C.-M. ( Hynix Semiconductor Inc. (South Korea) ) Oh, S.-Y. ( Hynix Semiconductor Inc. (South Korea) ) Nam, B.-H. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S.-C. ( Hynix Semiconductor Inc. (South Korea) ) Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 939
- Page(to):
- 946
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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