Blank Cover Image

Specification of the phase angle of a 6% attenuated PSM mask used in ArF lithography

Author(s):
  • Chang, C.H. ( United Microelectronics Corp. (Taiwan) )
  • Schacht, J. ( Infineon Technologies AG (Germany) )
  • Lin, B.S.-M ( United Microelectronics Corp. (Taiwan) )
  • Hung, K.C. ( United Microelectronics Corp. (Taiwan) )
  • Huang, I.H. ( United Microelectronics Corp. (Taiwan) )
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
902
Page(to):
910
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Extension of ArF lithography for poly gate patterning of 65-nm generation and beyond

Hsu, S.-H., Fang, S.-P., Huang, I.H., Lin, B.S., Hung, K.-C.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Impact of ArF attenuated PSM using multishifter layer (TiN/Si3N4) for next-generation lithography

Nam,K.-H., Kim,L.-J., Jeong,H.-S., Lee,S.-W., Lee,I.-S., Shin,C., Kim,H.-S., Dieu,L., Paek,S.W., Koo,S.-S., Bae,S.-M., …

SPIE-The International Society for Optical Engineering
2 Conference Proceedings TiSi-nitride-based attenuated phase-shift mask for ArF Lithography

Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings The effect between absorber profile and wafer print process window in ArF 6% Att. PSM mask

J. Tzeng, B. Lee, J. Lu, M. Kozuma, N. Chen, W. K. Lin, A. Chung, Y. C. Houng, C. H. Wei

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning

Hung,K.-C., Lin,B.S.-M., Chang,H.-A., Tseng,A., Chung,L.-S., Liu,W.-J., Wu,D.-Y., Huang,P.

SPIE - The International Society for Optical Engineering
9 Conference Proceedings Calibration of OPC models for multiple focus conditions

Schacht, J., Herold, K., Zimmermann, R., Torres, J.A., Maurer, W., Granik, Y., Chang, C.-H., Hung, G.K.-C., Lin, B.S.-M.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Challenges of 50-nm gate process in alternating phase shifting lithography

Fang, C.Y., Hung, K.C., Huang, Z.X., Lin, B.S., Hsu, S.H., Yen, Y.S., Yen, P.W., Huang, J., Liu, H.Y.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Application of chromeless phase lithography (CPL) masks in ArF lithography

Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM

Eom, T.-S., Lim, C.-M., Kim, S.-M., Kim, H.-B., Oh, S.-Y., Ma, W.-K., Moon, S.-C., Shin, K.S.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Development of attenuating PSM shifter for F2 and high-transmission ArF lithography

Nozawa, O., Shiota, Y., Mitsui, H., Suzuki, T., Ohkubo, Y., Ushida, M., Yusa, S., Nishimura, T., Noguchi, K., Sasaki, …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask [6349-197]

Tzeng, J., Lee, B., Lu, J., Kozuma, M., Chen, N., Lin, W. K., Chung, A., Houng, Y. C., Wei, C. H.

SPIE - The International Society of Optical Engineering
12 Conference Proceedings 0.13-ｦﾌm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks

Chen,Y.T., Lin,C.H., Lin,H.T., Hsieh,H.C., Yu,S.S., Yen,A.

SPIE - The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12