Customized illumination schemes for critical layers of 90-nm node dense memory devices in ArF lithography: comparison between simulation and experimental results
- Author(s):
Capetti, G. ( STMicroelectronics (Italy) ) Bollin, M. ( STMicroelectronics (Italy) ) Pepe, A. ( STMicroelectronics (Italy) ) Cotti, G. ( STMicroelectronics (Italy) ) Loi, S. ( STMicroelectronics (Italy) ) Iessi, U. ( STMicroelectronics (Italy) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 881
- Page(to):
- 893
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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