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Evaluation of IDEALSmile for 90-nm FLASH memory contact holes imaging with ArF scanner

Author(s):
Cantu, P. ( STMicroelectronics (Italy) )
Capetti, G. ( STMicroelectronics (Italy) )
Loi, S. ( STMicroelectronics (Italy) )
Lupo, M. ( STMicroelectronics (Italy) )
Pepe, A. ( STMicroelectronics (Italy) )
Saitoh, K. ( Canon Inc. (Japan) )
Yamazoe, K. ( Canon Inc. (Japan) )
Hasegawa, Y. ( Canon Inc. (Japan) )
Iwasa, J. ( Canon Italy (Italy) )
Toublan, O.R. ( Mentor Graphics Corp. (France) )
5 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
859
Page(to):
871
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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