Immersion lithography micro-objectives

Immersion lithography micro-objectives

Author(s):

Webb, J.E. ( Corning Tropel Corp. (USA) )
Denes, L. ( Corning Tropel Corp. (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

788

Page(to):

797

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.2

Type:

Conference Proceedings

Details

TDL ID:	ZA00013728
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Extending the Newtonian design form for ultrahigh numerical aperture and immersion lithography Webb, J.E. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Self-segregating materials for immersion lithography D. P. Sanders, L. K. Sundberg, P. J. Brock, H. Ito, H. D. Truong Society of Photo-optical Instrumentation Engineers
2 Conference Proceedings Optical metrology for 193-nm immersion objective characterization Aronstein, D., Bentley, J., Dewa, P.G., Dunn, M., Schreiber, H., Nguyen, T., Webb, J.E. SPIE - The International Society of Optical Engineering	8 Conference Proceedings 25 nm immersion lithography at 193 nm wavelength Choi, S.-H., Park, T.-H., Kim, E., Youn, H.-J., Lee, D.-Y., Ban, Y.-C., Je, A.-Y., Kim, D.-H., Hong, J.-S., Kim, Y.-H., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings High-index materials for 193 nm immersion lithography John H. Burnett, Simon G. Kaplan, Eric L. Shirley, Paul J. Tompkins, James E. Webb SPIE - The International Society of Optical Engineering	9 Conference Proceedings Aberration evaluation and tolerancing of 193-nm lithographic objective lenses Smith,B.W., Webb,J.E., Petersen,J.S., Meute,J. SPIE-The International Society for Optical Engineering
4 Conference Proceedings High-n immersion lithography H. Sewell, J. Mulkens, P. Graeupner, D. McCafferty, L. Markoya Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Simulation of the coupled thermal optical effects for liquid immersion micro-/nano-lithography Baek, S.-Y., Wei, A.C., Cole, D.C., Nellis, G., Yeung, M.S., Abdo, A.Y., Engelstad, R.L. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Performance enhancement of 157-nm Newtonian catadioptric objectives Webb, J.E., Rich, T., Philips, A.R., Cornell, J. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Status of 157 nm lithography and prospects for immersion Bendik, J. J., Yamaguchi, Y., Finkner, L. G., Smith, A. H. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Liquid immersion lithography at 157 nm Chen, C.-K., Gau, T.-S., Shiu, L.-H., Lin, B. J. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Experimental investigation of solid immersion lens lithography Bai, M., Lei, J., Zhang, L., Shiely, J. P. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12