OML: optical maskless lithography for economic design prototyping and small-volume production
- Author(s):
Sandstrom, T. ( Micronic Laser Systems AB (Sweden) ) Bleeker, A. ( ASML (Netherlands) ) Hintersteiner, J. ( ASML (Netherlands) ) Troost, K. ( ASML (Netherlands) ) Freyer, J. ( Micronic Laser Systems Inc. (Sweden) ) van der Mast, K. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 777
- Page(to):
- 787
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
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