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Simulation-based critical-area extraction and litho-friendly layout design for low-k1 lithography

Author(s):
Choi, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Ban, Y.-C. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, K.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, D.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Hong, J.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoo, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kong, J.-T. ( Samsung Electronics Co., Ltd. (South Korea) )
3 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
713
Page(to):
720
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.2
Type:
Conference Proceedings

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