Neural-network-based approach to resist modeling and OPC
- Author(s):
- Zach, F.X. ( IBM Microelectronics Div. (USA) )
- Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 670
- Page(to):
- 679
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.2
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Is model-based optical proximity correction ready for manufacturing? Study on 0.12- and 0.175-μm DRAM technology
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
New approach to global alignment in IC manufacturing based on a neural network model
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Approach for the evaluation of indirect measurement uncertainty based on neural networks
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
SAR interferometric phase denoising: a new approach based on wavelet transform
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Aberration analysis using reconstructed aerial images of isolated contacts on attenuated phase-shift masks
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
11
Conference Proceedings
Optimization of segmented alignment marks for advanced semidonductor fabrication processes
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Trans Tech Publications |