Characterization of ACLV for advanced technology nodes using scatterometer-based lens fingerprinting technique
- Author(s):
Wang, C.A. ( Texas Instruments Inc. (USA) ) Zhang, G. ( Texas Instruments Inc. (USA) ) DeMoor, S. ( Texas Instruments Inc. (USA) ) Tan, C. ( Texas Instruments Inc. (USA) ) Ilzhoefer, J. ( Texas Instruments Inc. (USA) ) Atkinson, C. ( Texas Instruments Inc. (USA) ) Wickman, C. ( ASML (USA) ) Hansen, S. ( ASML (USA) ) Geh, B. ( Carl Zeiss (Germany) ) Flagello, D.G. ( ASML (USA) ) Boehm, M. ( Texas Instruments Inc. (USA) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 581
- Page(to):
- 590
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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