New double exposure technique using alternating phase-shifting mask with reversed phase

New double exposure technique using alternating phase-shifting mask with reversed phase

Author(s):

Hotta, S. ( Hitachi, Ltd. (Japan) )
Hayano, K. ( Hitachi, Ltd. (Japan) )
Kakuta, K. ( Hitachi, Ltd. (Japan) )
Hasegawa, N. ( Hitachi, Ltd. (Japan) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

545

Page(to):

554

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Proposal of a composite phase-shifting mask for 0.15-ｦﾌm hole-pattern delineation using KrF exposure Hasegawa,N., Hayano,K., Imai,A., Asai,N., Okazaki,S. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Preliminary study of 65-nm-node alternating phase-shift mask fabrication Hosono, K., Ishikawa, N., Asai, S., Maruyama, H., Miyahara, Y., Sasaki, S., Yamashita, Y., Hotta, Y., Furukawa, T., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Lens aberration measurement technique using attentuated phase-shifting mask Imai,A., Hayano,K., Fukuda,H., Asai,N., Hasegawa,N. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Alternating phase-shift mask inspection through the use of phase contrast enhancement techniques Zurbrick, L.S., Rudzinski, M.W., Stokowski, S.E., He, L., Kimmel, K.R., Kashwala, N. SPIE-The International Society for Optical Engineering
3 Conference Proceedings New double exposure technique without alternating phase-shift mask T. Yamamoto, T. Yao, H. Futatsuya, T. Chijimatsu, S. Asai SPIE - The International Society of Optical Engineering	9 Conference Proceedings Technological challenges in implementation of alternating phase-shift mask Tsai,W., Qian,Q., Buckmann,K.M., Cheng,W.-H., He,L., Irvine,B., Kamna,M., Korobko,Y., Kovalchick,M., Labovitz,S.M., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings R-mask: a new concept and its application for small-volume production Hayano, K., Hotta, S., Hasegawa, N., Hosono, K., Tanaka, T., Suko, K., Sasaki, S., Mohri, H., Hoga, M., Hayashi, N. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Alternating phase-shift mask inspection using multiple simultaneous illumunation techniques Zurbrick, L.S., Heumann, J.P., Rudzinski, M.W., Stokowski, S.E., Urbach, J.-P, Wang, L. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Inspection of alternating phase-shift masks through the use of phase contrast techniques Zurbrick, L.S., Rudzinski, M.W., Stokowski, S.E., He, L., Kimmel, K.R., Kashwala, N. SPIE-The International Society for Optical Engineering	11 Conference Proceedings R-mask: simple and low-cost fabrication techniques Fujii, A., Sasaki, S., Shimizu, M., Kobayashi, Y., Tominaga, T., Hoga, M., Mohri, H., Hayashi, N., Hayano, K., Hasegawa, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Fabrication process of alternating phase-shift mask for practical use Ishiwata,N., Kobayashi,T., Yamamoto,T., Hasegawa,H., Asai,S. SPIE - The International Society for Optical Engineering	12 Conference Proceedings Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12