Degradation mechanism and materials for 157-nm pellicles

Degradation mechanism and materials for 157-nm pellicles

Author(s):

Garza, C.M. ( Digital DNA Labs. (USA) )
Bierschenk, T. ( ExFluor Corp. (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

527

Page(to):

536

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

Similar Items:

1 Conference Proceedings Production of novel materials for 157-nm and 193-nm soft pellicles Zimmerman, P.A., van Peski, C., Miller, D., Callahan, R.P., Cashion, M. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Mechanical analysis of hard pellicles for 157-nm lithography Reu,P.L., Mikkelson,A.R., Schlax,M.P., Cotte,E.P., Siewert,L.K., Engelstad,R.L., Lovell,E.G., Dao,G.T., Zheng,J.-F. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Behavior of candidate organic pellicle materials under 157-nm laser irradiation Grenville, A., Liberman, V., Rothschild, M., Sedlacek, J.H.C., French, R.H., Wheland, R.C., Zhang, X., Gordan, J. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Development of hard pellicle for 157 nm Okada, K., Ootsuka, K., Ishikawa, I., Ikuta, Y., Kojima, H., Kawahara, T., Minematsu, T., Mishiro, H., Kikugawa, S., … SPIE-The International Society for Optical Engineering
3 Conference Proceedings Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography French,R.H., Gordon,J.S., Jones,D.J., Lemon,M.F., Wheland,R.C., Zhang,E., Zumsteg Jr.,F.C., Sharp,K.G., Qiu,W. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Requirements for reticle and reticle material for 157-nm lithography: requirements for hard pellicle Miyazaki,J., Itani,T., Morimoto,H. SPIE-The International Society for Optical Engineering
4 Conference Proceedings 157-nm pellicles for photolithography: mechanistic investigation of the deep-UV photolysis of fluorocarbons Lee, K., Jockusch, S., Turro, N.J., French, R.H., Wheland, R.C., Lemon, M.F., Braun, A.M., Widerschpan, T., Zimmerman, … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Aberration determination in early 157-nm exposure system Smith, B.W., Conley, W., Garza, C.M., Meute, J., Miller, D.A., Rich, G.K., Graffenberg, V., Dean, K.R., Patel, S., Ford, … SPIE-The International Society for Optical Engineering
5 Conference Proceedings Hard pellicle investigation for 157-nm lithography: impact on overlay Bruls, R., Uitterdijk, T., Cicilia, O., De Bisschop, P., Kocsis, M. K., Grenville, A., Van Peski, C. K., Engelstad, R. … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Fused silica for 157-nm transmittance Smtth,C.M., Moore,L.A. SPIE - The International Society for Optical Engineering
6 Conference Proceedings 157-nm pellicles: polymer design for transparency and lifetime French, R.H., Wheland, R.C., Qiu, W., Lemon, M.F., Blackman, G.S., Zhang, E., Gordon, J., Liberman, V., Grenville, A., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Aerial image measurement system for 157-nm lithography Eisner, K., Kuschnerus, P., Urbach, J.-P., Schilz, C.M., Engel, T., Zibold, A.M., Yasui, T., Higashikawa, I. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12