RET integration of CPL technology for random logic
- Author(s):
Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Shi, X. ( ASML MaskTools, Inc. (USA) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. ( ASML MaskTools, Inc. (USA) ) Conley, W. ( Motorola, Inc. (USA) ) Litt, L.C. ( Motorola, Inc. (USA) ) Wu, W. ( Motorola, Inc. (USA) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 510
- Page(to):
- 526
- Pages:
- 17
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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