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Experimental investigation of fabrication process-, transportation-, storage, and handling-induced contamination of 157-nm reticles and vacuum UV cleaning

Author(s):
Okoroanyanwu, U. ( Advanced Micro Devices, Inc. (USA) and IMEC (Belgium) )
Stepanenko, N. ( Infineon Technologies AG (Germany) and IMEC (Belgium) )
Vereecke, G. ( IMEC (Belgium) )
Eliat, A. ( IMEC (Belgium) )
Kocsis, M.K. ( IMEC (Belgium) and Intel Corp. (USA) )
Kang, Y.S. ( IMEC (Belgium) and Samsung Electronics (South Korea) )
Jonckheere, R.M. ( IMEC (Belgium) )
Conard, T. ( IMEC (Belgium) )
Ronse, K.G. ( IMEC (Belgium) )
4 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. date:
2004
Page(from):
487
Page(to):
503
Pages:
17
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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