Blank Cover Image

Model-based OPC/DRC considering local flare effects

Author(s):
Futatsuya, H. ( Fujitsu Ltd. (Japan) )
Yao, T. ( Fujitsu Ltd. (Japan) )
Osawa, M. ( Fujitsu Ltd. (Japan) )
Ogino, K. ( Fujitsu Ltd. (Japan) )
Hoshino, H. ( Fujitsu Ltd. (Japan) )
Arimoto, H. ( Fujitsu Ltd. (Japan) )
Machida, Y. ( Fujitsu Ltd. (Japan) )
Asai, S. ( Fujitsu Ltd. (Japan) )
3 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
451
Page(to):
458
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Model-based lithography verification system for multilayer structure in electron-beam direct writing [6151-82]

Ogino K., Hoshino H., Machida Y.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings New double exposure technique without alternating phase-shift mask

T. Yamamoto, T. Yao, H. Futatsuya, T. Chijimatsu, S. Asai

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Development of a lithographic DRC technique for interactive use and batch processing

Futatsuya,H., Chijimatsu,T., Asai,S., Hanyu,I.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Global and local factors of on-chip variation of gate length

M. Osawa, K. Hosono, S. Asai

Society of Photo-optical Instrumentation Engineers
3 Conference Proceedings Practical method of evaluating two-dimensional resist features for lithographic DRC

Futatsuya,H., Chijimatsu,T., Asai,S., Hanyu,I.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Full chip compensation for local-flare-induced CD error using OPC/DRC method

J.-Y. Choi, Y.-A. Shim, K.-H. Yun, J.-D. Kim, J.-H. Kim

Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Model-based OPC for phase-shifter edge lithography

Futatsuya, H., Chijimatsu, T., Minami, T., Tsujimura, R., Komura, Y., Ito, Y., Asai, S.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Application of modified jog-fill DRC rule on LFD OPC flow

Y.-M. Kim, S.-U. Lee, J.-H. Kang, J.-H. Kim, K.-H. Kim

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Design-friendly DFM rule [6156-20]

Osawa, M., Minami, T., Futatsuya, H., Asai, S.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings 54. Modelling of HfO, film deposition from Hf(mmp)4

Yano, T., Kagotswne, A., Fujitnoro, T., Hoshino, M., Watanabe, T., Asai, M., Horii, S., Miya, H., Kamiyo, M., Hirao, K.

Electrochemical Society
6 Conference Proceedings Applying photolithography-friendly design to e-beam direct writing in 65-nm node and beyond

H. Hoshino, K. Ogino, Y. Machida, M. Miyajima, T. Maruyama

Society of Photo-optical Instrumentation Engineers
12 Conference Proceedings OPC modeling by genetic algorithm

W.C. Huang, C.M. Lai, B. Luo, C.K. Tsai, C.S. Tsay, C.W. Lai, C.C. Kuo, R.G. Liu, H.T. Lin, B.J. Lin

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12