Extending optical lithography with immersion
- Author(s):
Streefkerk, B. ( ASML (Netherlands) ) Baselmans, J. ( ASML (Netherlands) ) Gehoel-van Ansem, W. ( ASML (Netherlands) ) Mulkens, J. ( ASML (Netherlands) ) Hoogendam, C. ( ASML (Netherlands) ) Hoogendorp, M. ( ASML (Netherlands) ) Flagello, D.G. ( ASML (USA) ) Sewell, H. ( ASML (USA) ) Graupner, P. ( Carl Zeiss (Germany) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 285
- Page(to):
- 305
- Pages:
- 21
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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