Contact hole reticle optimization by using interference mapping lithography (IML)

Contact hole reticle optimization by using interference mapping lithography (IML)

Author(s):

Socha, R.J. ( ASML (USA) and Motorola (USA) )

Van Den Broeke, D.J. ( ASML (USA) and Motorola (USA) )

Hsu, S.D. ( ASML (USA) and Motorola (USA) )

Chen, J.F. ( ASML (USA) and Motorola (USA) )

Laidig, T.L. ( ASML (USA) and Motorola (USA) )

Corcoran, N. ( ASML (USA) and Motorola (USA) )

Hollerbach, U. ( ASML (USA) and Motorola (USA) )

Wampler, K.E. ( ASML (USA) and Motorola (USA) )

Shi, X. ( ASML (USA) and Motorola (USA) )

Conley, W. ( ASML (USA) and Motorola (USA) )

5 more

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

222

Page(to):

240

Pages:

19

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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