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Study of OPC for AAPSM reticles using various mask fabrication techniques

Author(s):
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
Kamaruddin, D. ( Motorola (USA) )
Nakagawa, K.H. ( DuPont Photomask, Inc. (USA) )
MacDonald, S. ( DuPont Photomask, Inc. (USA) )
Wilkinson, B. ( Motorola (USA) )
West, C. ( DuPont Photomasks, Inc. (USA) )
Park, K. ( DuPont Photomasks, Inc. (USA) )
2 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
204
Page(to):
211
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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