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Correction of 157-nm lens based on phase ring aberration extraction method

Author(s):
Meute, J. ( International SEMATECH (USA) )
Rich, G.K. ( International SEMATECH (USA) )
Conley, W. ( International SEMATECH (USA) )
Smith, B.W. ( Rochester Institute of Technology (USA) )
Zavyalova, L.V. ( Rochester Institute of Technology (USA) )
Cashmore, J.S. ( Exitech Ltd. (United Kingdom) )
Ashworth, D. ( Exitech Ltd. (United Kingdom) )
Webb, J.E. ( Corning Tropel Corp. (USA) )
Rich, L. ( Corning Tropel Corp. (USA) )
4 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
195
Page(to):
203
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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