Initial assessment of the lithographic impact of the use of hard pellicles: an overview

Initial assessment of the lithographic impact of the use of hard pellicles: an overview

Author(s):

De Bisschop, P. ( IMEC (Belgium) )
Kocsis, M.K. ( IMEC (Belgium) and Intel Corp. (USA) )
Bruls, R. ( ASML (Netherlands) )
Grenville, A. ( International SEMATECH (USA) and Intel Corp. (USA) )
Van Peski, C. ( International SEMATECH (USA) )

Publication title:

Optical Microlithography XVII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

5377

Pub. Year:

2004

Page(from):

116

Page(to):

123

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819452900 [0819452904]

Language:

English

Call no.:

P63600/5377.1

Type:

Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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