157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
- Author(s):
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Lee, J.-W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kurose, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Itani, T. ( NEC Electronics Corp. (Japan) ) Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Cashmore, J.S. ( Exitech Ltd. (United Kingdom) ) Gower, M. ( Exitech Ltd. (United Kingdom) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 104
- Page(to):
- 115
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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