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Lithography of choice for the 45-nm node: new medium, new wavelength, or new beam?

Author(s):
Uesawa, F. ( Sony Corp. (Japan) )
Katsumata, M. ( Sony Corp. (Japan) )
Ogawa, K. ( Sony Corp. (Japan) )
Takeuchi, K. ( Sony Corp. (Japan) )
Omori, S. ( Sony Corp. (Japan) )
Yoshizawa, M. ( Sony Corp. (Japan) )
Kawahira, H. ( Sony Corp. (Japan) )
2 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. Year:
2004
Page(from):
34
Page(to):
45
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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