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Optical lithography in the sub-50-nm regime

Author(s):
Flagello, D.G. ( ASML (USA) )
Arnold, B. ( ASML (USA) )
Hansen, S. ( ASML (USA) )
Dusa, M. ( ASML (USA) )
Socha, R.J. ( ASML (USA) )
Mulkens, J. ( ASML (Netherlands) )
Garreis, R. ( Carl Zeiss (Germany) )
2 more
Publication title:
Optical Microlithography XVII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5377
Pub. date:
2004
Page(from):
21
Page(to):
33
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452900 [0819452904]
Language:
English
Call no.:
P63600/5377.1
Type:
Conference Proceedings

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