Optical lithography in the sub-50-nm regime
- Author(s):
Flagello, D.G. ( ASML (USA) ) Arnold, B. ( ASML (USA) ) Hansen, S. ( ASML (USA) ) Dusa, M. ( ASML (USA) ) Socha, R.J. ( ASML (USA) ) Mulkens, J. ( ASML (Netherlands) ) Garreis, R. ( Carl Zeiss (Germany) ) - Publication title:
- Optical Microlithography XVII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5377
- Pub. Year:
- 2004
- Page(from):
- 21
- Page(to):
- 33
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452900 [0819452904]
- Language:
- English
- Call no.:
- P63600/5377.1
- Type:
- Conference Proceedings
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