Resolution enhancement technology: the past, the present, and extensions for the future

Resolution enhancement technology: the past, the present, and extensions for the future

Author(s):: Schellenberg, F.M. ( Mentor Graphics Corp. (USA) )
Publication title:: Optical Microlithography XVII
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 5377
Pub. Year:: 2004
Page(from):: 1
Page(to):: 20
Pages:: 20
Pub. info.:: Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819452900 [0819452904]
Language:: English
Call no.:: P63600/5377.1
Type:: Conference Proceedings

Details

TDL ID:	ZA00013727
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2004 : 17th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2004.02.24-2004.02.27

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