Blank Cover Image

Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication

Author(s):
Jung, M.-H. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, H.-W. ( Samsung Electronics Co., Ltd. (South Korea) )
Hong, J. ( Samsung Electronics Co., Ltd. (South Korea) )
Woo, S.-G. ( Samsung Electronics Co., Ltd. (South Korea) )
Cho, H.-K. ( Samsung Electronics Co., Ltd. (South Korea) )
Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1100
Page(to):
1106
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Comparison of ArF bilayer resists for sub-90 nm L/S fabrication

Hong, J., Kim, H.-W., Lee, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Improvement of pattern collapse in sub-100 nm nodes

Jung, M.-H., Lee, S.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell

Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Optical performance enhancement technique for 45-nm node with binary mask

J. -S. Jung, H. -B. Kim, J. -W. Lee, S. G. Woo, H. -K. Cho

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Strategy for sub-80-nm contact hole patterning considering device fabrication

Yoon, J.-Y., Hata, M., Hah, J.-H., Kim, H.-W., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings A simple and accurate resist parameter extraction method for sub-80-nm DRAM patterns

Lee, S., Hwang, C., Park, D.-W., Kim, I.-S., Kim, H.-C., Woo, S.-G., Cho, H.-K., Moon, J.-T.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Evaluation of ArF CLM in the sub-100-nm DRAM cell

Lee, J.-H., Chung, D.-H., Kim, H.-C., Nam, D.-S., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Lee, J.-H., Kim, H.-D., Chung, D.-H., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings ArF issues of 90-nm-node DRAM device integration

Goo, D.-H., Kim, B.-S., Park, J.-S., Yoon, K.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, J.-T.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Novel high-performance ArF resist for sub-100-nm lithography

Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Realization of sub-80-nm small-space patterning in ArF photolithography

Kim, S.-H., Kim, H.-D., Lee, S.-H., Park, C.-M., Ryoo, M.-H., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S., Moon, …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Most feasible curing process for ArF resists in device integration aspect

Kim, H.-W., Kang, Y., Lee, J.-H., Chae, Y.-S., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12