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Advances in resist pattern transfer process using 157-nm lithography

Author(s):
Furukawa, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Hagiwara, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Kawaguchi, E. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Matsunaga, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Itani, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1064
Page(to):
1073
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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