Blank Cover Image

Improved performance of Apex-E photoresist with the application of the electric-field-enhanced PEB

Author(s):
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
1017
Page(to):
1022
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Verification of a high-resolution PEB parameter extraction methodology based on double exposure technique

Yuan, L., Neureuther, A.R.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Performance of repaired defects and attPSM in EUV multilayer masks

Deng, Y., La Fontaine, B., Neureuther, A.R.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Images in photoresist for self-interferometric electrical image monitors

J. Rubinstein, A. R. Neureuther

Society of Photo-optical Instrumentation Engineers
8 Conference Proceedings Initial experimental verification: characterizing tool illumination and PSM performance with phase-shifting masks

McIntyre, G.R., Neureuther, A.R.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Improving chemically amplified resist modeling for 2D layout patterns

Yuan, L., Neureuther, A.R.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Platform for collaborative DFM [6156-13]

Poppe, W. J., Capodieci, L., Neureuther, A.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Lithographic performance of advanced thin resists

Williamson,M., Neureuther,A.R.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Database and data analysis strategy for multi-designer testchips

W. J. Poppe, P. Au, D. Jayasuriya, A. Neureuther

Society of Photo-optical Instrumentation Engineers
5 Conference Proceedings Layout ’hot spots’ for advancing optical technologies [6154-140]

Holwill, J., Mcintyre, G., Poppe, W., Neureuther, A R.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Role of illumination and thin film layers on the printability of defects

R.J. Socha, A.R. Neureuther

Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Enhanced quantitative analysis of resist image contrast upon line- edge roughness (LER)

Williamson, M.V., Neureuther, A.R.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Interferometric-probe aberration monitor performance in the production environment

Robins, G.C., Neureuther, A.R., Dusa, M., Kye, J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12