Blank Cover Image

High-temperature negative resist tunable for new lift-off applications

Author(s):
Toukhy, M.A. ( Clariant Corp. (USA) )
Lu, P.H. ( Clariant Corp. (USA) )
Kao, K. ( Clariant Corp. (USA) )
Plass, R. ( Clariant Corp. (USA) )
Chen, C.-H. ( Lumileds Lighting (USA) )
Faerber, G.L. ( Lumileds Lighting (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
924
Page(to):
928
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings High-resolution negative i-line resist and process for metal lift-off applications

Toukhy, M.A., Mullen, S.K., Lu, P.-H., Neisser, M.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Development of nanocomposite resists with high plasma etch resistance

C. Chen, H. Zhuang, P. Lu, M. Neisser, G. Pawlowski

SPIE - The International Society of Optical Engineering
2 Conference Proceedings TMAH soak process optimization with DNQ positive resist for lift-off applications

Mullen, S.K., Toukhy, M.A., Lu, P.-H., Dixit, S.S., Sellers, P.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings New room-temperature cw InGaAsSb/AlGaAsSb QW ridge diode lasers and their application to CO measurements near 2.3 ｦﾌm

Maiorov,M.A., Wang,J., Baer,D.S., Lee,H., Belenky,G.L., Hanson,R.K., Connolly,J.C., Garbuzov,D.Z.

SPIE - The International Society for Optical Engineering
3 Conference Proceedings Performance comparison of negative resists for copper rerouting and other electroplating applications

M. Toukhy, C. Chen, M. Paunescu, G. Pawlowski

Society of Photo-optical Instrumentation Engineers
9 Conference Proceedings Chemically amplified resist technology for i-line applications

Toukhy,M.A., Malik,S., Blakeney,A.J., Schlicht,K.R.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Design and process of a new DUV ARCH3 resist

Bantu,N., Maxwell,B., Medina,A., Sarubbi,T.R., Toukhy,M.A., Schacht,H., Falcigno,P.A., Munzel,N., Petschel,K., …

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Maleimide-based tetrapolymers for use in lift-off resists

Chen, C.X., Hurditch, R.J., Johnson, D.W., Nawrocki, D.J.

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Development of thick negative photoresists for electroplating applications

C. Chen, R. Plass, E. Ng, S. Lee, S. Meyer

Society of Photo-optical Instrumentation Engineers
11 Conference Proceedings Automated CD-error compensation for negative-tone chemically amplified resists by zone-controlled post-exposure bake

Berger, L., Dress, P., Gairing, T., Chen, J.J., Hsieh, R.-G., Lee, H.-C., Hsieh, H.-C.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Resist composition effects on ultimate resolution of negative-tone chemically amplified resists

Pain,L., Gourgon,C., Patterson,K., Scarfogliere,B., Tedesco,S.V., Fanget,G.L., Dal'Zotto,B., Ribeiro,M., Kusumoto,T., …

SPIE-The International Society for Optical Engineering
12 Conference Proceedings HIGH TEMPERATURE STRENGTH OF ORDERED AND DISORDERED Ni4Mo

Kao, H. P., Brooks, C. R., Vasudevan, K.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12