Effect of the rinse solution to avoid 193-nm resist line collapse: a study for modification of resist polymer and process conditions
- Author(s):
Masuda, S. ( Clariant (Japan) K.K. (Japan) ) Kobayashi, M. ( Clariant (Japan) K.K. (Japan) ) Kim, W.-K. ( Clariant Corp. (USA) ) Anyadiegwu, C. ( Clariant Corp. (USA) ) Padmanaban, M. ( Clariant Corp. (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Tanaka, K. ( Tokyo Electron Kyushu Ltd. (Japan) ) Yamada, Y. ( Tokyo Electron Kyushu Ltd. (Japan) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 819
- Page(to):
- 829
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.2
- Type:
- Conference Proceedings
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