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Novel rinse process for reducing pattern collapse in 0.30-k1 ArF lithography

Author(s):
Lee, G. ( Hynix Semiconductor Inc. (South Korea) )
Hwang, Y.S. ( Hynix Semiconductor Inc. (South Korea) )
Ban, K.D. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Moon, S.C. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
813
Page(to):
818
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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