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Influence of activation energy on LER in chemically amplified KrF photoresists

Author(s):
Kim, J.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, C.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, S.B. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, W.M. ( Samsung Electronics Co., Ltd. (South Korea) )
Moon, S.S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, K.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
Lee, S.Y. ( Samsung Electronics Co., Ltd. (South Korea) )
Yoon, S. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, Y.H. ( Samsung Electronics Co., Ltd. (South Korea) )
Chon, S.-M. ( Samsung Electronics Co., Ltd. (South Korea) )
5 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
790
Page(to):
800
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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