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Characterization of outgassing for EUV technology

Author(s):
Thirumala, V. ( Intel Corp. (USA) )
Cao, H.B. ( Intel Corp. (USA) )
Yueh, W. ( Intel Corp. (USA) )
Choi, H. ( Intel Corp. (USA) )
Golovkina, V. ( Univ. of Wisconsin/Madison (USA) )
Wallace, J. ( Univ. of Wisconsin/Madison (USA) )
Nealey, P.F. ( Univ. of Wisconsin/Madison (USA) )
Thielman, D. ( Univ. of Wisconsin/Madison (USA) )
Cerrina, F. ( Univ. of Wisconsin/Madison (USA) )
4 more
Publication title:
Advances in resist technology and processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
765
Page(to):
772
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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