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Single-layer and bilayer resist processes for EUV-type integrations

Author(s):
Peters, R.D. ( Motorola, Inc. (USA) )
Parker, C. ( Motorola, Inc. (USA) )
Cobb, J. ( Motorola, Inc. (USA) )
Luckowski, E. ( Motorola, Inc. (USA) )
Weisbrod, E. ( Motorola, Inc. (USA) )
Dauksher, B. ( Motorola, Inc. (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
746
Page(to):
756
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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