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New BARC materials for the 65-nm node in 193-nm lithography

Author(s):
Neef, C.J. ( Brewer Science, Inc. (USA) )
Krishnamurthy, V. ( Brewer Science, Inc. (USA) )
Nagatkina, M.I. ( Brewer Science, Inc. (USA) )
Bryant, E. ( Brewer Science, Inc. (USA) )
Windsor, M. ( Brewer Science, Inc. (USA) )
Nesbit, C. ( Brewer Science, Inc. (USA) )
1 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
684
Page(to):
688
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.2
Type:
Conference Proceedings

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