PEB sensitivity variation of 193-nm resist according to activation energy of protection groups
- Author(s):
Oh, S.K. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J.Y. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, J.W. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) ) Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) ) Lee, G. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) ) Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) ) Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 625
- Page(to):
- 632
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.1
- Type:
- Conference Proceedings
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