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PEB sensitivity variation of 193-nm resist according to activation energy of protection groups

Author(s):
Oh, S.K. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J.Y. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, J.W. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, D. ( Dongjin Semichem Co., Ltd. (South Korea) )
Kim, J. ( Dongjin Semichem Co., Ltd. (South Korea) )
Lee, G. ( Hynix Semiconductor Inc. (South Korea) )
Jung, J.C. ( Hynix Semiconductor Inc. (South Korea) )
Bok, C.K. ( Hynix Semiconductor Inc. (South Korea) )
Shin, K.S. ( Hynix Semiconductor Inc. (South Korea) )
4 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
625
Page(to):
632
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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